Brontek’s PlasmaArc Implanter as a Critical Technology
The PlasmaArc Implanter is an emerging technology for ion implantation in microelectronics manufacturing. It is designed to fit a critical need in the International Technology Roadmap for Semiconductors (ITRS). This is the need for an ion source that can maintain the current throughput as the ion energies drop below 1000 electron-Volts (eV) to form ultra-shallow junctions (USJ) in the transistors of the next generation integrated circuits. The present focus in on boron (B) ions, because B ion delivery is the main bottleneck in the ITRS.
To see how the PlasmaArc Implanter’s throughput would compare with the state-of-the-art in boron ion delivery, based on current data, click Critical Technology to view downloadable document (pdf).
The patented PlasmaArc Implanter is based on vacuum (cathodic) arc technology. Technical references can be found here.