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Here is a list of Brontek’s scientific papers and reports:

Boron cathodic arc as an ion source for shallow junction ion implantation of boron.  J. M. Williams, C.C. Klepper, D. J. Chivers, R. C. Hazelton, J. J. Moschella, J. Vac. Sci. Technol B,  26 ( 2008) 368.

Operation and Applications of the Boron Cathodic Arc Ion Source.  J. M. Williams, C. C. Klepper, D. J. Chivers, R. C. Hazelton, J. H. Freeman, Ion Implantation Technology, 2008. AIP Conference Proceedings 1066, American Institute of Physics, Melville (2008) p 469.

Boron Ion Implantation into Silicon by Use of the Boron Vacuum-Arc Plasma Generator. J. M. Williams, C. C. Klepper, D. J. Chivers, R. C. Hazelton , J. J. Moschella, M. D. Keitz. ION IMPLANTATION TECHNOLOGY, 16th International Conference on Ion Implantation Technology, Marseille, France, June 11-16, 2006, Ed. by Karen J. Kirkby, Russell Gwilliam, Andy Smith and David Chivers (American Institute of Physics 2006) p 261.

Ion implantation of boron into silicon by use of the boron cathodic-arc plasma generator: First results. J.M. Williams, C.C. Klepper, R.C. Hazelton. Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions with Materials & Atoms, vol.237, no.1-2, Aug. 2005, pp.278-83.

FePt nanoparticles formed in Al₂O₃ by ion beam synthesis: Annealing environment effects. White, C. W.; Withrow, S. P.; Williams, J. M.; Budai, J. D.; Meldrum, A.; Sorge, K. D.; Thompson, J. R.; Boatner, L. A. Journal of Applied Physics, Volume 95, Issue 12 (2004) pp. 8160-8166.

Key Patent:

Boron Ion Delivery System,  James M. Williams, US 7,238,597,B2
Date of patent:  Jul 3, 2007
Filed Sept. 19, 2003