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Brontek Delta Corporation, a Virginia Corporation, incorporated October 25, 2002.

As of October 2008, the Company’s management is as follows:

David J. Chivers is the Chief Executive Officer (CEO) - effective in October 2008.

James Martin Williams is co-Founder and Chief Technical Officer (CTO).

C. Christopher Klepper is co-Founder and President.

The Founders jointly chair the Board of Directors.

A Board of Technical and Business Advisors is in place to advise the CEO and CTO on technical and business strategy issues. This board currently includes

J. H. Freeman providing technical advice on plasma sources and their application to ion implantation of semiconductors.

C. W. (Woody) White who has served as Senior Corporate Fellow from the early stages of the company, advises on applications of ion implantation to the production of nanophase materials.

Brief Biographical Sketches:

      English born David James Chivers began working with the Harwell Laboratory in 1962 as a Trainee Research Assistant working in the Metallurgy, Solid State Physics and Nuclear Physics Divisions, as well as with the Chemistry Division’s Spectroscopy Group.  It was his work with this group on stable isotopic target preparation that led to his position at Harwell as a full-time member of  the Electromagnetic Separator Group and the development of the Freeman Ion source.  The Freeman ion source and its accelerator is now an integral component of all commercial semiconductor implantation equipment.

 

       David Chivers has also been involved in the design and development of new target chamber systems to facilitate the implantation of silicon wafers with high uniformity and product throughput, which has contributed to the use of ion implantation equipment for production processing.  Through his collaboration with university and industrial research, he has contributed to the development and exploitation of ion implantation as a viable industrial process.

 

       Since leaving the Harwell Laboratory he has been a key senior manager in Ion Beam Services, a dedicated ion implant company specializing in all aspects of the technology.

 

       In 2004 he set up his own ion implantation consultancy company, Ion Links International Ltd., and in 2006 he became a director of Smart Implant Technologies, an implant service company.

 

      Although assuming the role of CEO of Brontek Delta Corporation provides Chivers at last with an official role in the company, Chivers has been both an advisor and a strategic partner (via Ion Links) to Brontek, since its early days. This is reflected in Brontek’s technical publications since 2004.  Chivers brings into the company not only more current knowledge of the technical field of ion implantation for semiconductors, but also commercial experience in the business of ion implantation equipment for semiconductors.

 

      Chivers was Chairman of the 16th Conference on Ion Implantation Technology (IIT-2006) and plans to continue to be active in this community as well as continue his lectures at Edinburgh and Surrey Universities and at the IIT Implant Technology School.

 

 

 

      James Martin Williams is co-founder and CTO of Brontek Delta Corporation. The main body of Williams career has been in the Solid State Division of Oak Ridge National Laboratory. His early career was in the area of radiation damage in reactor materials. Because of use of accelerators in simulation of high dose radiation damage for reactors, he made a seamless transition to ion implantation and ion beam modification of materials. His first research, purely in that area was in the early 1980’s, and was on dose and temperature dependency of amorphization of the wide bandgap semiconductor, SiC, together with studies on epitaxial recrystallization of the material. That research formed the basis for successful doping recipes for the material. He later became better recognized, together with R. A. Buchanan, for seminal research in the area of ion implantation of orthopedic materials. That research is the acknowledged cornerstone for founding of that industry, which has now achieved some $ 100 M in sales for wholesale surface treatments alone, without credit for benefits to society.

 

      Williams has authored or co-authored over 90 refereed journal articles, invited reviews and book chapters. He has presented some 100 oral presentations, including 20 invited, and 10 of which were at meetings of national or international scope. He was Martin Marietta Inventor of the Year in 1985. He played a key role in technology developments that positioned the Surface Modification And Characterization (SMAC) facility as a world leader in its field. He was the lead organizer and Proceedings Editor. Materials Research Society Symposium on Biomedical Materials, 1985. More recently, he was the Chairman and Organizer, 10th International Conference on Surface Modification of Metals by Ion Beams, Gatlinburg, TN, Sept. 21-27, 1997 (SMMIB-97). Williams is the inventor of the proposed application of the pure boron plasma generator to p-doping and brings a combination of experiences in fundamental science and successful commercial and practical engineering that is invaluable in the research and product development phase of the business.

 

 

 

      Dr. C.Christopher Klepper is a co-founder of Brontek Delta Corporation and served as its CEO since founding and through September 2008. Dr. Klepper, who received his PhD in 1985 from the University of Texas at Austin, began his career as a Staff Scientist at the Oak Ridge National Laboratory (ORNL). During his decade at the national lab under the direction of the Department of Energy (DOE), Dr. Klepper was responsible for a number of experiments in fusion energy, participating in research projects at the national and international level. In that stage of his career, Dr. Klepper pioneered novel sensor technologies with applications not only for fusion energy, but also for materials processing and manufacturing.

 

      Seeing the value of these technologies for commercial applications, Dr. Klepper joined HY-Tech Research Corporation of Radford, Virginia, in 1997. Working through this private research company, he was able to finance the development of new technologies by raising well over $3M in funding, primarily through the Small Business Innovative Research (SBIR) program and also through Collaborative Research Agreements (CRADA). The Collaborative Research Agreements teamed Dr. Klepper once again with DOE labs, and with private industry consortia.

 

      He has been the principal investigator of these SBIR projects and has been awarded four grants and contracts at the Phase II level, three of which completed with successful technology demonstration and a successful patent. To assure commercialization of one particular technology, a high-density boron plasma source, he and his business partner, J.M. Williams, founded Brontek-Delta, to pursue Williams’ idea to apply this technology to ion implantation for IC manufacturing. Dr. Klepper is an author of more than 60 reviewed scientific articles. He is a Senior Member of the IEEE, a member of the AVS Science and Technology Society and the Society of Vacuum Coaters, as well as an alumnus of Sigma Pi Sigma and Phi Beta Kappa. He continues to serve Brontek as its President, as well as an active researcher. He is also still on the research staff at HY-Tech, as well as working with ORNL and DOE on ITER-related Fusion Energy projects.

 

 

 

 

      J. H. Freeman - DSc. CChem. FRSC. CPhys. FInstP., has been (and continues to be) not only a valuable technical advisor, but also a strong advocate and endorser of Brontek’s plasma source for applications in ion implantation of silicon in integrated circuit manufacturing.After graduating from London University Harry Freeman worked at Harwell on a wide range of scientific and engineering programs. During the early years he was primarily involved in the nuclear research activities of the Atomic Energy Authority and he made a major contribution to the Harwell project, which succeeded in synthesizing and characterizing a large fraction of the known compounds of polonium.

 

      He eventually assumed overall responsibility for the UKAEA programs of Applied Radiation Chemistry and Electromagnetic Isotope Separation and he was also actively involved in the early diversification activity of the Atomic Energy Authority through the extension of his work on isotope-separator technology to non-nuclear areas. This resulted in the development of the novel ion sources and accelerators for which he is well known; but he was also heavily involved in the pioneering research at Harwell on the now established process of ion implantation in semiconductor manufacture. See, for example, numerous references to freeman ion source on internet search engine

 

      In addition, from 1965-1985 he was the UK representative on the Management Committee of the Euratom Central Bureau for Nuclear Measurements (CBNM) at Geel, Belgium.

 

      In 1975 he transferred to the Marine Technology Support Unit (MATSU) of the UK Department of Energy and in 1981 he was appointed as Head of the Unit. MATSU was the executive arm of the Department for the management of its major programme of contract research in support of UK offshore oil and gas operations. This covered both its responsibilities for safety as well as its aim to improve the competitiveness of the UK marine and offshore industry. It involved the execution of an unusually broad portfolio of scientific and engineering research with over 300 projects and an annual expenditure of over £20 million.

 

      In 1986 he was seconded to the Foreign Office as the Counsellor for Science and Technology at the British Embassy in Paris with an exceptionally broad range of governmental, scientific and industrial responsibilities.

 

      In 1990, following his return to the UK, he was appointed to a specially created Integrated Chair at Salford University where he also acted as advisor to British Nuclear Fuels Ltd on its R&D programmes, and on French nuclear matters.

 

      Since 1994 he has acted as a scientific consultant on ion implantation and related matters to various organizations and he continued to retain close links with Salford as a Visiting Professor.

 

      He has published over seventy scientific papers and several patents and he is the joint author of a textbook on ion implantation.

 

      Dr. C. W. White  received a B. S. in Physics from MIT in 1962 and a PhD in Physics from Duke University in 1968. From October 1967 until October 1975 he was a member of the Technical Staff at Bell Laboratories, Murray Hill, New Jersey. From then until June 2003 October 1975 he was a member of the Ion-Solid Interactions Group in the Solid State Division at the Oak Ridge National Laboratory. He was group leader of the Ion-Solid Interactions Group for fourteen years.

 

      White is internationally recognized for his work in ion beam processing of materials and ion beam analysis. He pioneered work on the use of ion beam synthesis to produce encapsulated nanocrystals in insulating matrices. He is author or co-author of over 350 publications in scientific journals and conference proceedings. He holds 9 patents for his work. He has presented over 30 invited talks at various national and international conferences. He has organized two international conferences, the annual meeting of the Materials Research Society (MRS) in 1981, and several technical symposia. He has edited four books and has served on the editorial board for three scientific journals. He served as President of the MRS in 1984. He is a Fellow of the American Physical Society and has won several awards ( two from the Department of Energy and an IR-100 Award) for his research. The MRS named its service award (The WOODY Award) for him, and he was its first recipient in 1984.